1. Identificação | |
Tipo de Referência | Artigo em Evento (Conference Proceedings) |
Site | mtc-m16c.sid.inpe.br |
Código do Detentor | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
Identificador | 8JMKD3MGP8W/364QNJ5 |
Repositório | sid.inpe.br/mtc-m18@80/2009/09.21.19.44 |
Repositório de Metadados | sid.inpe.br/mtc-m18@80/2009/09.21.19.44.02 |
Última Atualização dos Metadados | 2020:04.28.17.49.06 (UTC) administrator |
Chave Secundária | INPE--PRE/ |
Chave de Citação | PillacaKostUedaSilv:2009:StInSt |
Título | Study of the Influence of a Static Magnetic Field on the Plasma Immersion Ion Implantation Process |
Ano | 2009 |
Data de Acesso | 21 maio 2024 |
Tipo Secundário | PRE CI |
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2. Contextualização | |
Autor | 1 Pillaca, E. J. D. M. 2 Kostov, K. G. 3 Ueda, Mário 4 Silva Júnior, A. R. |
Grupo | 1 2 3 LAP-CTE-INPE-MCT-BR 4 LAP-CTE-INPE-MCT-BR |
Afiliação | 1 UNESP 2 UNESP 3 Instituto Nacional de Pesquisas Espaciais (INPE) 4 Instituto Nacional de Pesquisas Espaciais (INPE) |
Nome do Evento | International Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D). |
Localização do Evento | São José dos Campos, SP |
Data | 7-11 Sept. |
Tipo Terciário | Poster |
Histórico (UTC) | 2009-09-21 19:44:03 :: simone -> administrator :: 2020-04-28 17:49:06 :: administrator -> simone :: 2009 |
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3. Conteúdo e estrutura | |
É a matriz ou uma cópia? | é a matriz |
Estágio do Conteúdo | concluido |
Transferível | 1 |
Tipo do Conteúdo | External Contribution |
Resumo | Plasma immersion ion implantation (PIII) is an established method for the treatment and surface modification of materials. This technique is fast and efficient in treating 3D targets, however, PIII owns some disadvantages. Perfect dose uniformity is usually difficult to achieve when treating samples of complex shape. The problem arises from the uncontrolled expansion of plasma sheath. Several studies have shown that to obtain an uniform implantation the extension of plasma sheath must be kept always small in relation to target size. Recent studies have demonstrated that the sheath expansion as well as secondary electrons dynamics in PIII are significantly affected by an external magnetic field, especially in the case when the magnetic field is parallel to the workpiece surface. in this work, we have analyzed by means of numerical simulation the effect of external magnetic field on the PIII process. The magnetic field configuration is similar to that of magnetic trap and is produced by a set of external coils. The simulation has been carried out for nitrogen plasma using the 2.5D computer code KARAT that employs the particle-in-cell (PIC) algorithm. It is found that a high density plasma region is formed around the target due to intense background gas ionization by the magnetized electrons drifting in the crossed ExB field. As a result, the sheath expansion is suppressed and an increase of implantation current in comparison to the PIII process without magnetic field is observed. Later, the validity of numerical simulation has been investigated experimentally. The plasma parameters were determined from the characteristic curve of a double Langmuir prove. The results show that magnetic field configuration ensures efficient plasma confinement in the center of the vacuum chamber where the magnetic field has minimum value. This result is in agreement with the numerical simulation. |
Área | FISPLASMA |
Arranjo | urlib.net > LABAP > Study of the... |
Conteúdo da Pasta doc | não têm arquivos |
Conteúdo da Pasta source | não têm arquivos |
Conteúdo da Pasta agreement | não têm arquivos |
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4. Condições de acesso e uso | |
Grupo de Usuários | simone administrator |
Visibilidade | shown |
Permissão de Leitura | allow from all |
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5. Fontes relacionadas | |
Repositório Espelho | sid.inpe.br/mtc-m18@80/2008/03.17.15.17.24 |
Unidades Imediatamente Superiores | 8JMKD3MGPCW/3ET2RFS |
Acervo Hospedeiro | sid.inpe.br/mtc-m18@80/2008/03.17.15.17 |
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6. Notas | |
Campos Vazios | archivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume |
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7. Controle da descrição | |
e-Mail (login) | simone |
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